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Title:
EXPOSURE METHOD, DEVICE, ILLUMINATION OPTICAL DEVICE, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP2014116611
Kind Code:
A
Abstract:

To provide an exposure device using an illumination system that enables patterns of various pitches to be simultaneously transferred at high resolution.

An exposure device has: an illumination optical system 12 configured to illuminate a reticle R with illumination light IL; and a projecting optical system PL configured to project an image of a pattern of the reticle R onto a wafer W. The exposure device comprises: a forming optical system that is configured to make an illuminating condition for the reticle R variable, and that is able to create a light quantity distribution by refraction optical elements 21 and 22, which generate luminous fluxes distributed in a plurality of areas where centers are arranged outside an optical axis on a predetermined face in an illumination optical system 12 conjugate with the pupil face of the projection optical system PL, such that quantities of light in the plurality of areas are larger than those in other areas; and a polarization setting member configured to set the polarized states of luminous fluxes generated from the refraction optical elements 21 and 22.


Inventors:
KUDO TAKETO
HIRUKAWA SHIGERU
Application Number:
JP2013272100A
Publication Date:
June 26, 2014
Filing Date:
December 27, 2013
Export Citation:
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Assignee:
NIKON CORP
International Classes:
H01L21/027; G02B5/04; G02B19/00; G03F7/20
Domestic Patent References:
JPH10208993A1998-08-07
JPH05160002A1993-06-25
JPH06267825A1994-09-22
JPH05217840A1993-08-27
JPH07147223A1995-06-06
JPH06163350A1994-06-10
JPH08335552A1996-12-17
JPH07220995A1995-08-18
JP2000311853A2000-11-07
JP2002261004A2002-09-13
JP2002231619A2002-08-16
JPH0653120A1994-02-25
JPH10208993A1998-08-07
JPH05160002A1993-06-25
JPH06267825A1994-09-22
JPH05217840A1993-08-27
JPH07147223A1995-06-06
JPH06163350A1994-06-10
JPH08335552A1996-12-17
JPH07220995A1995-08-18
JP2000311853A2000-11-07
JP2002261004A2002-09-13
Foreign References:
WO2000011706A12000-03-02
WO2000011706A12000-03-02
Attorney, Agent or Firm:
Seiji Ohno
Kobayashi Hideyoshi
Shinji Kato
Mamoru Suzuki
Hiroshi Otani



 
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