EXPOSURE METHOD AND EXPOSURE DEVICE

Japanese Patent JP2011027824

A

To provide an exposure method for ensuring good alignment at an end in moving direction of an exposure region when forming coloring pixels in slit exposure for a pattern of a black matrix.

The exposure method uses an exposure device provided with a front imaging camera CM-A obtaining position information of an alignment mark of a first pattern in a reverse moving direction of a substrate 50 from an optical axis, and a rear imaging camera CM-B in a moving direction, uses a photomask provided with a front imaging opening 53-A and a rear imaging opening 53-B for imaging the alignment mark, images the alignment mark moving below the photomask PM3 with a front imaging camera or/and a rear imaging camera, and aligns the pattern of the photomask for the first pattern from position information of the obtained alignment mark to radiate exposure light.

JP2001092108	METHOD AND DEVICE FOR MANUFACTURING PHOTOMASK AND METHOD OF MANUFACTURING DEVICE
JPH0831728	STAGE DEVICE
WO/2015/110191	METHOD OF DETERMINING A MEASUREMENT SUBSET OF METROLOGY POINTS ON A SUBSTRATE, ASSOCIATED APPARATUS AND COMPUTER PROGRAM

MATSUI KOHEI
HATTA KAORU
ARAI TOSHISHIGE
TAKESHITA TAKURO

JP2009171030A

February 10, 2011

July 22, 2009

Click for automatic bibliography generation  

TOPPAN PRINTING CO LTD
V TECHNOLOGY CO LTD

G03F9/00; H01L21/027

JPH09274520A	1997-10-21
JP2004246025A	2004-09-02
JP2008310164A	2008-12-25
JP2005116779A	2005-04-28
JP2004287336A	2004-10-14
JPH09274520A	1997-10-21
JP2004246025A	2004-09-02

Previous Patent: IMAGE FORMING AGENT STORAGE CONTAINER, IMAGE FORMING APPARATUS, METHOD OF MOUNTING IMAGE FORMING AGE...

Next Patent: DEVICE, AND METHOD FOR PROCESSING SOUND, AND PROGRAM