To provide an exposure method for ensuring good alignment at an end in moving direction of an exposure region when forming coloring pixels in slit exposure for a pattern of a black matrix.
The exposure method uses an exposure device provided with a front imaging camera CM-A obtaining position information of an alignment mark of a first pattern in a reverse moving direction of a substrate 50 from an optical axis, and a rear imaging camera CM-B in a moving direction, uses a photomask provided with a front imaging opening 53-A and a rear imaging opening 53-B for imaging the alignment mark, images the alignment mark moving below the photomask PM3 with a front imaging camera or/and a rear imaging camera, and aligns the pattern of the photomask for the first pattern from position information of the obtained alignment mark to radiate exposure light.
HATTA KAORU
ARAI TOSHISHIGE
TAKESHITA TAKURO
V TECHNOLOGY CO LTD
JPH09274520A | 1997-10-21 | |||
JP2004246025A | 2004-09-02 | |||
JP2008310164A | 2008-12-25 | |||
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JP2004287336A | 2004-10-14 | |||
JPH09274520A | 1997-10-21 | |||
JP2004246025A | 2004-09-02 |