Title:
EXPOSURE METHOD AND EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2012128413
Kind Code:
A
Abstract:
To provide an exposure method and an exposure device.
An exposure device in the invention that performs exposure by exposing an object substance with predetermined thickness to light includes: a light source for emitting light to the object substance; a support medium for supporting the object substance; an optical filter that is placed between the light source and the support medium and is provided with multiple filter areas which selectively filter each specific wavelength band included in the light; and transfer means for transferring the optical filter.
Inventors:
YI CHANG-BO
CUI ZHEHAO
MOK JEE-SOO
CUI ZHEHAO
MOK JEE-SOO
Application Number:
JP2011258019A
Publication Date:
July 05, 2012
Filing Date:
November 25, 2011
Export Citation:
Assignee:
SAMSUNG ELECTRO MECH
International Classes:
G03F7/20; H01L21/027
Domestic Patent References:
| JP2007012970A | 2007-01-18 | |||
| JPH0297011A | 1990-04-09 | |||
| JP2006250982A | 2006-09-21 | |||
| JP2010197540A | 2010-09-09 | |||
| JPH0955350A | 1997-02-25 |
Attorney, Agent or Firm:
Hidekazu Miyoshi
Masakazu Ito
Masakazu Ito
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