Title:
露光方法及び装置、並びにデバイス製造方法
Document Type and Number:
Japanese Patent JP5709071
Kind Code:
B2
Abstract:
A drive device drives a wafer stage (WST) in a Y-axis direction based on a measurement value of an encoder (62A) that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale (39Y 1 ) that is measured by the encoder. In this case, the drive device can drive the wafer stage in a predetermined direction based on a measurement value after correction in which a measurement error caused by the flatness of the scale included in the measurement value of the encoder is corrected based on the information on the flatness of the scale. Accordingly, the wafer stage can be driven with high accuracy in a predetermined direction using the encoder, without being affected by the unevenness of the scale.
Inventors:
Yuichi Shibasaki
Application Number:
JP2014000972A
Publication Date:
April 30, 2015
Filing Date:
January 07, 2014
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
H01L21/027; G01B11/00; G03F7/20
Domestic Patent References:
| JP7270122A | ||||
| JP3167419A | ||||
| JP63292005A | ||||
| JP2002525858A | ||||
| JP2006054452A |
Foreign References:
| WO2006057263A1 |
Attorney, Agent or Firm:
Atsushi Tateishi