Title:
EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP2008064989
Kind Code:
A
Abstract:
To expose a high-quality image of high picture quality which is less in fluctuation of areas of rectangles caused by fluctuation of line width upon forming an image of repeated rectangular patterns in image drawing by digital scanning exposure using a spatial modulation element such as a DMD (Digital Micromirror Device).
The drawing is carried out by controlling a relative scanning direction of a substrate (a medium to be exposed) and a spatial modulation element to be coincident with the short side of the rectangle.
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Inventors:
SAIDA HIROBUMI
SUMI KATSUTO
SUMI KATSUTO
Application Number:
JP2006241936A
Publication Date:
March 21, 2008
Filing Date:
September 06, 2006
Export Citation:
Assignee:
FUJIFILM CORP
International Classes:
G03F7/20; G02F1/1335
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Hiroshi Fukushima
Haruko Sanwa
Hiroshi Fukushima