PURPOSE: To eliminate exchanging of reticles and to improve exposure processing efficiency by shutting or exposing one normal pattern and one monitoring pattern alternately and adequately thereby forming the monitoring pattern properly on a substrate to be exposed.

CONSTITUTION: Pattern shutters 12, 13 are provided on both sudes of a reticle 11 formed of one monitoring pattern M in the circumferential parts of nine normal patterns P1WP9. The shutters 12, 13 are slid laterally to shut or expose, for example, the patterns P1 and M alternately, whereby the monitoring pattern is properly transferred on a substrate 2 to be exposed.