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Title:
EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP2008270570
Kind Code:
A
Abstract:

To provide an exposure system which decreases an editing operation load of a recipe with a change of a component.

This exposure system executes an exposure processing according to the recipe constituted containing a plurality of components. The exposure system includes a first holding part 1, a first change part 3 and a second change part 4. The first holding part 1 holds the plurality of components. The first change part 3 changes contents of the component held by the first holding part 1. The second change part 4 changes the component held by the first holding part 1 referring to the component held by the first holding part 1 and changed by the first change part 3 in response to the corresponding change.


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Inventors:
KOJIMA YUJI
TSUCHIYA YUUKEN
Application Number:
JP2007112298A
Publication Date:
November 06, 2008
Filing Date:
April 20, 2007
Export Citation:
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Assignee:
CANON KK
International Classes:
H01L21/027
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura



 
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