Title:
EXPOSURE SYSTEM
Document Type and Number:
Japanese Patent JP3219627
Kind Code:
B2
Abstract:
PURPOSE: To shorten an exposure device, which uses a laser of a pulse oscillation system as a light source, in exposure time by a method wherein a first signal that makes a charged voltage, which determines the emission energy of a laser, start being built up and a second signal which enables the laser to emit laser beams are changed in input time interval corresponding to the charged voltage.
CONSTITUTION: After a first signal that makes a charged voltage, which determines the emission energy of a laser 1, start being built up is inputted, a second signal which makes the laser 1 emit laser beams is inputted, whereby the laser 1 starts emitting pulse laser beams. Furthermore, energy detecting means 4 to 6 which detect the energy of laser beams are provided, and a following charged voltage is controlled on the basis of the detection results obtained from the energy detecting means. In an exposure system as mentioned above, a means which changes the first signal and the second signal in input time interval corresponding to a charged voltage is provided. For instance, a charged voltage is actually measured, and then the first signal and the second signal are controlled in input time interval.
Inventors:
Yuji Yasufuku
Application Number:
JP581695A
Publication Date:
October 15, 2001
Filing Date:
January 18, 1995
Export Citation:
Assignee:
Canon Inc
International Classes:
G03F7/20; H01L21/027; H01S3/097; (IPC1-7): H01L21/027; G03F7/20; H01S3/097
Domestic Patent References:
| JP2177414A | ||||
| JP47883A | ||||
| JP562876A |
Attorney, Agent or Firm:
Keizo Nishiyama (1 person outside)