Title:
EXPOSURE TO CHARGED BEAM
Document Type and Number:
Japanese Patent JPS5792831
Kind Code:
A
Abstract:
PURPOSE:To enable to make a wafer to be held and fixed to a sample holder by a method wherein the circumferential part of the wafer is pressed to be held and fixed to a curved surface of the sample holder having the curved reference face constituting a part of a cylinder being convex downward or being convex upward. CONSTITUTION:The circumferential part of the wafer 1 is pressed mechanically onto the curved reference face 10a of the sample holder 1 having the curved reference face 10a constituting a part of the cylinder being convex upward, and the wafer 1 is fixed to be held to the sample holder 10 therewith. Then the sample holder 10 is transferred continuously along the axial direction (the X direction) of the cylinder, and an electron beam E is made to scan stepwisely only by the minute distance in the Y direction being at right angles to the X direction to draw one drawing region of the warer 1. Therefore one region to be drawn when the sample holder 10 is to be transferred continuously can be considered to be nearly the plane, and to change the supplementary value when the sample holder 10 is to be transferred continuously is needless. Accordingly favorable precision of patterning can be obtained without reducing precision of drawing. Moreover, the curved face 10a may be formed as to constitute a part of a cylinder being convex downward.
Inventors:
NAKASUJI MAMORU
Application Number:
JP16859780A
Publication Date:
June 09, 1982
Filing Date:
November 29, 1980
Export Citation:
Assignee:
TOKYO SHIBAURA ELECTRIC CO
International Classes:
H01L21/027; H01J37/34; (IPC1-7): H01L21/30