ＥＵＶリソグラフィシステムにおける光学素子寿命の延長

Japanese Patent JP7337819

B2

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

JP2008172084	EXPOSURE EQUIPMENT, COLLECTION AND DELIVERY EQUIPMENT, AND EXPOSURE METHOD
JP2008004647	POSITIONING APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
JP2002328007	METHOD FOR MEASURING POSITION OF STAGE, METHOD AND APPARATUS FOR EXPOSURE, AND METHOD OF MANUFACTURING DEVICE

Ma, Yue
Kempen, Antonius, Theodoros, Wilhelms
Hummer, claus, martin
Morse, Johannes, Hubertus, Josefina
Romers, jeroen, hubert
Van de Wiel, Hubertus, Johannes
Laforge, Andrew, David
Brizuela, Fernando
Wiggers, Rob, Carlo
Gomez, Umesh, Prasad
Nedanovska, Elena
Korkmaz, Ceral
Kim, Alexander, Down
Duarte Rodriguez Nunes, Louis, Miguel
Van Dyck, Hendrix, Alphonsus, Ludovicus
van drent, william, peter
Yonkers, Peter, Geraldas
Chu, Chiusi
Yagobi, Param
Vesterlaken, Jean, Stephen, Christiaan
Linders, Martinus, Hendricus, Antonius
Elsov, Alexander, Igolevich
Formenkov, Igor, Vladimirovich
Liu, Faye
Jacobs, Johannes, Henrykas, Wilhelms
Kuznetsov, Alexei, Sergevich

JP2020542837A

September 04, 2023

February 28, 2019

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ASM L Netherlands B.V.

G03F7/20; H05G2/00

JP2002261001A
JP2008263173A
JP2009016640A
JP2014510404A
JP2017509920A

Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito

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