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Title:
EXTREME ULTRA VIOLET (EUV) RADIATION SOURCE FOR GENERATING EXTREME ULTRAVIOLET (EUV) LIGHT
Document Type and Number:
Japanese Patent JP2004165139
Kind Code:
A
Abstract:

To reduce arcing generation and nozzle erosion in a laser plasma extreme ultra violet radiation source.

One or more solutions are used for preventing materials of a nozzle assembly 40 of the radiation source 10 from being evaporated by an electrical discharge form a plasma 30. A first solution includes utilization of an electrically insulated nozzle end such as a glass capillary tube 46. The tube 46 is elongated beyond all conductive surface of the nozzle assembly 40 by an appropriate distance so that a pressure around the conductive portion of the nozzle assembly 40 closest to the plasma 30 can be lowered so as not to induce an arc discharge. A second solution includes electrically insulating the conductive portion of the radiation source 10 from a vacuum chamber wall. A third solution includes increasing a potential of the nozzle assembly 40 to that of the arc by applying a bias voltage 52 to the nozzle assembly 40.


Inventors:
Orsini, Rocco A.
Petach, Michael B.
Michaelian, Mark E.
Shields, Henry
Mcgregor, Roy D.
Fornaca, Steven W.
Application Number:
JP2003000169006
Publication Date:
June 10, 2004
Filing Date:
June 13, 2003
Export Citation:
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Assignee:
NORTHROP GRUMMAN CORP
International Classes:
G21K5/00; G03F7/20; G21K5/02; G21K5/08; H01L21/027; H05G2/00; H05H1/24; (IPC1-7): H05G2/00; G03F7/20; G21K5/00; G21K5/02; G21K5/08; H01L21/027; H05H1/24