To provide an extreme ultraviolet light source device capable of preventing a breakdown of a driver laser caused by reflected light (returned light) reflected by a target material or plasma and returning to the driver laser.
The extreme ultraviolet light source device comprises a target supplying part for supplying a target in a chamber; the driver laser for emitting a laser beam; a laser collection optical system for generating plasma by collecting the laser beam to the target; an EUV light collection optical system for collecting and emitting an extreme ultraviolet light emitted from the plasma; a spatial filter for decreasing the quantity of returned light when the collected laser beam reflected by the target or the plasma comes into the drive laser; a returned light detector for detecting the returned light passing through the spatial filter; a position control mechanism for controlling the position of an optical element included in the laser collection optical system; and a control part for controlling the position control mechanism on the basis of the quantity of returned light detected by the returned light detector.
MORIYA MASATO
SMAN GEORG
ARIGA TATSUYA
ASAYAMA TAKESHI
GIGAPHOTON INC
| JP2007109451A | 2007-04-26 | |||
| JP2000343257A | 2000-12-12 | |||
| JP2002280322A | 2002-09-27 | |||
| JP2000357835A | 2000-12-26 | |||
| JPH0634068B2 | 1994-05-02 | |||
| JP2008532232A | 2008-08-14 |
Atsushi Watanabe
Mutsumi Yanase