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Title:
FABRIC FOR SKIN CLEANSING AND METHOD FOR PRODUCING THE SAME
Document Type and Number:
Japanese Patent JP2006336149
Kind Code:
A
Abstract:

To provide a fabric for skin cleansing, excellent in effect cleanly dropping sebum or/stain, etc., buried in the bottoms or the vicinities of the pores of the skin in every holes and corners by using the fabric together with soap, etc., when washing the skin surfaces of human bodies, e.g. washing the face in order to carry out removal of makeup and capable of readily and directly confirming the effect with touch of the hand without damaging the skin surface and to provide a method for producing the fabric.

The fabric for cleaning the skin comprises using a fabric composed of ultrafine fiber having ≥0.001 decitex and ≤1.0 decitex single fiber fineness on the surface and using a fabric excellent in air permeability on the rear surface to form a two-layer structure.


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Inventors:
OKUDA MASAFUMI
KIYOMURA ETSUO
FUKUDA YASUO
Application Number:
JP2005000162358
Publication Date:
December 14, 2006
Filing Date:
June 02, 2005
Export Citation:
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Assignee:
TORAY INDUSTRIES
International Classes:
D03D15/00; A47K7/02; B32B5/26; D03D1/00; D06M11/00; D06M11/38; D06M13/355; D06M17/00; D06M101/32; D06M101/34
Domestic Patent References:
JP2005095252A2005-04-14
JP2004332149A2004-11-25
JPH0833588A1996-02-06