FACILITY FOR MANUFACTURING SEMICONDUCTOR - MATSUSHITA ELECTRONICS CORP

Title:

FACILITY FOR MANUFACTURING SEMICONDUCTOR

Document Type and Number:

Japanese Patent JPH11145022

Kind Code:

A

Abstract:

To provide a facility for manufacturing a semiconductor capable of productively forming a film requiring repeated treatment process and effectively forming several other films.

A flow shop facility unit 20 having a plurality of processing facilities 21 conducting several treatment to form a predetermined film placed in line along a work transferring path 7 based on a treatment sequence is set and combined with a first job shop facility unit 2 having all of a whole process facility 6 and the work transferring path 7 kept in highly clean state, a second job shop facility unit 3 having a part of a process facility 8 and the work transferring path T kept in highly clean state, and a third job shop facility unit 4 having only the work transferring path 7 kept in highly clean state.

Inventors:

AOKI NORISHIGE
FUJITA MASAHITO
NISHIWAKI TORU
FUJIWARA KAZUO
MITSUI AKIRA
UEDA SEIJI
HAMA NOBORU
KAWADA SHINICHI

Application Number:

JP31171397A

Publication Date:

May 28, 1999

Filing Date:

November 13, 1997

Export Citation:

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Assignee:

MATSUSHITA ELECTRONICS CORP

International Classes:

E04H5/02; F24F7/06; H01L21/02; (IPC1-7): H01L21/02; E04H5/02; F24F7/06

Attorney, Agent or Firm:

Ishihara Masaru

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