Title:
イオン注入に基づくプラズマのファラデードーズ及び均一性監視背景技術
Document Type and Number:
Japanese Patent JP4928439
Kind Code:
B2
Abstract:
A Faraday dose and uniformity monitor can include a magnetically suppressed annular Faraday cup surrounding a target wafer. A narrow aperture can reduce discharges within Faraday cup opening. The annular Faraday cup can have a continuous cross section to eliminate discharges due to breaks. A plurality of annular Faraday cups at different radii can independently measure current density to monitor changes in plasma uniformity. The magnetic suppression field can be configured to have a very rapid decrease in field strength with distance to minimize plasma and implant perturbations and can include both radial and azimuthal components, or primarily azimuthal components. The azimuthal field component can be generated by multiple vertically oriented magnets of alternating polarity, or by the use of a magnetic field coil. In addition, dose electronics can provide integration of pulsed current at high voltage, and can convert the integrated charge to a series of light pulses coupled optically to a dose controller.
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Inventors:
Walther, Stephen, Earl.
Dry, Rajesh
Pershing, harold
Shore, jay
Kuu, Bon-Won
Pedersen, Bjorn, Oh.
Levit, Chris
Miller, Timothy
Dry, Rajesh
Pershing, harold
Shore, jay
Kuu, Bon-Won
Pedersen, Bjorn, Oh.
Levit, Chris
Miller, Timothy
Application Number:
JP2007506183A
Publication Date:
May 09, 2012
Filing Date:
March 04, 2005
Export Citation:
Assignee:
Varian Semiconductor Equipment Associates Incorporated
International Classes:
H01J37/317; H01J37/244; H01J37/32
Domestic Patent References:
| JP2002522899A | 2002-07-23 | |||
| JP2000243720A | 2000-09-08 | |||
| JP2004052005A | 2004-02-19 | |||
| JPS5596164A | 1980-07-22 | |||
| JPH10195648A | 1998-07-28 | |||
| JPS6236565A | 1987-02-17 | |||
| JPS61211950A | 1986-09-20 |
Attorney, Agent or Firm:
Mizuno Yuuki