Title:
FERROELECTRIC THIN FILM LAMINATE SUBSTRATE, FERROELECTRIC THIN FILM ELEMENT AND METHOD OF MANUFACTURING FERROELECTRIC THIN FILM LAMINATE SUBSTRATE
Document Type and Number:
Japanese Patent JP2016184687
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a niobate acid type ferroelectric thin film laminate substrate that enables reduction of the cost while maintaining the performance and the characteristics as a thin film element, and a ferroelectric thin film element cut out from the laminate substrate.SOLUTION: A ferroelectric thin film laminate substrate includes a lower electrode layer, a ferroelectric thin film layer, an upper electrode intermediate layer, and an upper electrode layer which are sequentially laminated on a substrate. The lower electrode layer is made of Pt or Pt alloy, and the ferroelectric thin film layer consists of (KNa)NbO(0.4≤x≤0.7), the upper electrode layer is made of Al or an Al alloy, and the upper electrode intermediate layer is made of metal which is less oxidizable metal than Ti and capable of generating an intermetallic compound with Al, and a part of the upper electrode intermediate layer and a part of the upper electrode layer are alloyed.SELECTED DRAWING: Figure 2
Inventors:
HORIKIRI FUMIMASA
SHIBATA KENJI
WATANABE KAZUTOSHI
SUENAGA KAZUFUMI
ENDO HIROYUKI
SHIBATA KENJI
WATANABE KAZUTOSHI
SUENAGA KAZUFUMI
ENDO HIROYUKI
Application Number:
JP2015064704A
Publication Date:
October 20, 2016
Filing Date:
March 26, 2015
Export Citation:
Assignee:
SUMITOMO CHEMICAL CO
International Classes:
H01L41/047; C01G33/00; H01L21/8246; H01L27/105; H01L37/02; H01L41/187; H01L41/29
Domestic Patent References:
| JP2010161330A | 2010-07-22 | |||
| JP2015053417A | 2015-03-19 | |||
| JP2011192736A | 2011-09-29 |
Foreign References:
| US20050082584A1 | 2005-04-21 |
Attorney, Agent or Firm:
Polaire Patent Business Corporation