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Title:
FIELD EMISSION TYPE ELECTRON SOURCE AND ELECTRON BEAM APPLICATION DEVICE USING IT
Document Type and Number:
Japanese Patent JP2009129547
Kind Code:
A
Abstract:

To provide a field emission type electron source excellent in durability, a yield rate, and electron beam emission performance, as well as an electron beam application device using the same.

For the electron source structured of a filament part made of carbon connected to an electrode, and solid protruded part of a conical or pyramid shape made of carbon integrally formed at a center of the filament part, at least an outermost surface of the protruded tip part is to be of a graphite layer. Further, the field emission type electron source is to be applied for various electron beam application devices. The electron source is structured of a solid protruded part with at least an outermost surface of its tip of a graphite layer, so that a tip shape of the protruded part as a field emission site is controlled, there is little defect in the graphite layer, and it is excellent in durability and electron emission performance.


Inventors:
Fujieda, Tadashi
Okai, Makoto
Application Number:
JP2007000299977
Publication Date:
June 11, 2009
Filing Date:
November 20, 2007
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORP
International Classes:
H01J1/304; H01J9/02; H01J37/073; H01J1/30; H01J9/02; H01J37/06