To provide a film deposition apparatus for a vapor-deposited thin film having excellent pre-tilt angle controllability which is capable of uniformly depositing an inorganic oriented film on a substrate of a large area and suitable for depositing a liquid crystal oriented film.

The film deposition apparatus for the vapor-deposited thin film comprises: a substrate conveying means 17 for moving a substrate 11 to be vapor-deposited; a plurality of vapor deposition sources 12, 13 for performing vapor deposition with a predetermined angle respectively with respect to a line section depicted by a locus of movement of the substrate conveying means; a deposition preventive member 14 having a plurality of slits 15, 16 provided between the substrate conveying means and the vapor deposition sources; and a vapor deposition source control means capable of simultaneously operating the plurality of vapor deposition sources and independently controlling the supplied power of the plurality of vapor deposition sources.