Title:
FILM DEPOSITION APPARATUS, AND FILM DEPOSITION METHOD USING THE SAME
Document Type and Number:
Japanese Patent JP2015206067
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of executing film formation economically efficiently, and to provide a film deposition method using the same.SOLUTION: A film deposition apparatus 10 has a film deposition chamber 11, and a nozzle 15 arranged in the film deposition chamber 11, for jetting film raw powder 12 to a film deposition target 13 by using carrier gas, to thereby form a film 14 on the surface of the film deposition target 13. A film formation room 16 capable of arranging the film deposition target 13 inside, and having the nozzle 15 installed therein is provided further in the film deposition chamber 11. In a film deposition method using the film deposition apparatus 10, a cold spray method is used for formation of the film 14.
Inventors:
SAKATA KAZUNORI
TAGOMORI KOJI
NAKAGAWA NARIYUKI
KAWASHITA NOBUO
TATSUWA TOSHIO
MURAKAMI RYO
TAGOMORI KOJI
NAKAGAWA NARIYUKI
KAWASHITA NOBUO
TATSUWA TOSHIO
MURAKAMI RYO
Application Number:
JP2014086518A
Publication Date:
November 19, 2015
Filing Date:
April 18, 2014
Export Citation:
Assignee:
FUJIKI KOSAN
NISSAN MOTOR
NISSAN MOTOR
International Classes:
C23C24/04
Domestic Patent References:
| JP2007231317A | 2007-09-13 | |||
| JP2008274352A | 2008-11-13 |
Foreign References:
| WO2014057951A1 | 2014-04-17 |
Attorney, Agent or Firm:
Fujio Nakamae
Yohei Kiyoi
Yoshihiro Kurita
Fujimoto Katsune
Yohei Kiyoi
Yoshihiro Kurita
Fujimoto Katsune