To provide a film deposition apparatus capable of moving a vapor deposition head for blowing a film deposition material of an object to be processed between the film deposition position and the storage position.
A six-layer continuous film deposition apparatus 10 comprises: a plurality of vapor deposition sources 155 with a film deposition material stored therein; a plurality of connection pipes 150 which are connected to the plurality of vapor deposition sources 155 to convey the film deposition material vaporized by the vapor deposition sources 155; a plurality of vapor deposition heads 125 which are connected to the plurality of connection pipes 150 respectively and arranged in the height direction while being separated from one another; and a processing chamber 100 for continuously executing the film deposition of the object to be processed therein with the film deposition material blown from the plurality of vapor deposition heads 125. The plurality of vapor deposition heads 125 are moved between the storage position and the film deposition position for blowing the film deposition material conveyed through the plurality of connection pipes 150 toward a substrate G.
COPYRIGHT: (C)2010,JPO&INPIT
SUSA TAMAO
| JP2004327272A | 2004-11-18 | |||
| JP2004055401A | 2004-02-19 | |||
| JP2008150649A | 2008-07-03 | |||
| JP2004146369A | 2004-05-20 |
Tetsuo Kanamoto
Koji Hagiwara