FILM DEPOSITION APPARATUS AND SUBSTRATE HOLDER

Title:

FILM DEPOSITION APPARATUS AND SUBSTRATE HOLDER

Document Type and Number:

Japanese Patent JP2014077161

Kind Code:

A

Abstract:

To provide a film deposition apparatus and a substrate holder in which good film deposition processing can be implemented on both surfaces of substrates-under-processing held by the substrate holder.

A substrate holder 11 comprises openings 22 which exposes surfaces of substrates-under-processing S at a bottom section of a concavity 21 housing the substrates-under-processing S, and supporting sections 23 which support the substrates-under-processing S by contacting outer peripheral edges of the substrates-under-processing S. Outer surfaces of the supporting sections 23 are constructed so that their tip sides are slant planes 24 slanting towards the substrates-under-processing S. The substrates-under-processing S are carried to a processing section 50 while being held in the substrate holder 11, and film deposition processing on both surfaces of the substrates-under-processing S is implemented.

Inventors:

HASEGAWA TAKEYUKI
NAGASAWA SHOJI
OTOMO MASAHIKO
MATSUMOTO TAKESHI
KATAGIRI HIROAKI
OTA ATSUSHI
WATAI MIWA

Application Number:

JP2012224451A

Publication Date:

May 01, 2014

Filing Date:

October 09, 2012

Export Citation:

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Assignee:

ULVAC CORP

International Classes:

C23C14/34

Domestic Patent References:

JPH08213442A	1996-08-20
JP2000119841A	2000-04-25

Foreign References:

WO1998052083A1

1998-11-19

Attorney, Agent or Firm:

Hiroyuki Kurihara
Muranaka

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