Title:
成膜装置
Document Type and Number:
Japanese Patent JP5081712
Kind Code:
B2
Abstract:
A film depositing apparatus comprises: a transport unit that transports a substrate along a predetermined transport path; a first film deposition compartment that is provided with a first film depositing unit for forming an organic layer on a surface of the substrate; a second film deposition compartment that is disposed downstream of the first film deposition compartment in the transport path and which is provided with a second film depositing unit for forming an inorganic layer on top of the organic layer; and an evacuating unit that reduces the pressures within the first film deposition compartment and the second film deposition compartment.
Inventors:
Tatsuya Fujinami
Hiroyuki Nishida
Akihiro Kadota
Hiroyuki Nishida
Akihiro Kadota
Application Number:
JP2008120211A
Publication Date:
November 28, 2012
Filing Date:
May 02, 2008
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
C23C14/06; C23C14/56; C23C16/54; (IPC1-7): E06B9/262; A47H23/04; A47H13/01
Domestic Patent References:
| JP61086970A | ||||
| JP2002542392A | ||||
| JP7188902A | ||||
| JP6330319A | ||||
| JP54054004A | ||||
| JP61253639A |
Foreign References:
| US20060117988 |
Attorney, Agent or Firm:
Nozomi Watanabe
Haruko Sanwa
Haruko Sanwa