Title:
FILM DEPOSITION SYSTEM
Document Type and Number:
Japanese Patent JP2001220673
Kind Code:
A
Abstract:
To prevent the increase of the temperature of a substrate in emergency.
In emergency, in the case a substrate is included in the heating region of a treating chamber 14A, this substrate is carried to an adjacent corner chamber 22A or 22B. Alternatively, in the case a substrate is included in the heating region of a treating chamber 14B, this substrate is carried to an adjacent corner chamber 22B or a treating chamber 14C.
Inventors:
NOZAWA NAOYUKI
NAGAI MOTOMASA
WATANABE NAOKI
HORIGUCHI AOSHI
NAGAI MOTOMASA
WATANABE NAOKI
HORIGUCHI AOSHI
Application Number:
JP2000025164A
Publication Date:
August 14, 2001
Filing Date:
February 02, 2000
Export Citation:
Assignee:
ANELVA CORP
International Classes:
C23C14/54; G11B5/85; (IPC1-7): C23C14/54; G11B5/85
Attorney, Agent or Firm:
Takashi Ogaki