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Title:
FILM DEPOSITION APPARATUS
Document Type and Number:
Japanese Patent JP2017082342
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of suppressing an increase of a substrate temperature.SOLUTION: A film deposition apparatus includes: a film deposition part 20 discharging a particle including a film formation material toward a substrate; a cryopump 31 cooling a cooling member 33; a film deposition lanes 50a arranging the substrate to a place away from the cooling member 33 and facing the cooling member 33 and a recovery lane 50b; and a displacement part changing a position of the cooling member 33 along a displacement direction. The film deposition part 20, the film deposition lane 50a, and the recovery lane 50b are disposed along the displacement direction in this order. The displacement part changes the position of the cooling member 33 between a first position and a second position, the first position being a position between the film deposition lane 50a and the recovery lane 50b in the displacement direction, and the second position being farther away from the film deposition part 20 than the recovery lane 50b in the displacement direction. The displacement part positions the cooling member 33 to the fist position while the film deposition lane 50a arranges the substrate S, and positions the cooling member 33 to the second position while the recovery lane 50b arranges the substrate S.SELECTED DRAWING: Figure 6

Inventors:
ONO TETSUHIRO
SATO MASARU
NAKAJIMA TEPPEI
Application Number:
JP2017012178A
Publication Date:
May 18, 2017
Filing Date:
January 26, 2017
Export Citation:
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Assignee:
ULVAC CORP
International Classes:
C23C14/34; C23C14/24; H01L51/50; H05B33/10
Domestic Patent References:
JP2006085933A2006-03-30
JPH0291340U1990-07-19
JP2009019243A2009-01-29
JP2001185364A2001-07-06
JPH0673542A1994-03-15
JP2005285576A2005-10-13
JP2011184751A2011-09-22
Foreign References:
US20120118541A12012-05-17
WO2008050662A12008-05-02
US20010023820A12001-09-27
Attorney, Agent or Firm:
Makoto Onda
Hironobu Onda