Title:
Film deposition system
Document Type and Number:
Japanese Patent JP6081842
Kind Code:
B2
Abstract:
A film-forming device includes: a microwave supplying unit, which supplies microwaves for generating plasma along a treatment surface of a central conductor comprising at least a conductive workpiece material; a negative voltage applying unit, which applies to the workpiece material a negative bias voltage for expanding a sheath layer along the treatment surface of the workpiece material; a microwave transmitting window, which make the microwave, which is supplied by the microwave supplying unit, propagate to the expanded sheath layer through a microwave transmitting surface thereof, and a surrounding wall, which surrounds the microwave transmitting surface of the microwave transmitting window and protrudes beyond the microwave transmitting surface in a propagation direction in which the microwaves propagate.
Inventors:
Kentaro Shinoda
Kazuya Taki
Hideki Kaneda
Hiroyuki Uesaka
Yasuyuki Takaoka
Kazuya Taki
Hideki Kaneda
Hiroyuki Uesaka
Yasuyuki Takaoka
Application Number:
JP2013069713A
Publication Date:
February 15, 2017
Filing Date:
March 28, 2013
Export Citation:
Assignee:
Brother Industries, Ltd.
Nagoya University
Nagoya University
International Classes:
C23C16/44; C23C16/511; H05H1/46
Domestic Patent References:
| JP2009070735A | ||||
| JP5062909A | ||||
| JP2000340548A | ||||
| JP2006083405A | ||||
| JP2010174325A | ||||
| JP2004047207A |
Foreign References:
| WO2008010537A1 |
Attorney, Agent or Firm:
Patent business corporation NEXT