Title:
成膜装置及び成膜方法
Document Type and Number:
Japanese Patent JP4549697
Kind Code:
B2
Abstract:
Film forming equipment and a film forming method, by which a film forming process can be performed immediately after aligning a substrate with a mask, a substrate transfer system between different types of chambers is eliminated and a film can be continuously formed. In a same vacuum chamber (2), an alignment unit (3) for aligning the substrate (5) with the mask (6), a transfer tray (4) for receiving the substrate (5) and the mask (6) from the alignment unit (3), and a plurality of film forming sources (81A)-(81F) which are arranged along a transfer path of the transfer tray (4) are provided. To transfer the substrate (5) and the mask (6) between the alignment unit (3) and the transfer tray (4), a magnet holder (61) is separated from a magnet lifting mechanism (12) through a locking part (67).
Inventors:
Hisato Tanaka
Application Number:
JP2004060097A
Publication Date:
September 22, 2010
Filing Date:
March 04, 2004
Export Citation:
Assignee:
ULVAC, Inc.
International Classes:
C23C14/04; H05B33/10; H01L21/677; H01L21/68; H01L51/50; H05B33/14
Domestic Patent References:
| JP2002302757A | ||||
| JP2003332052A | ||||
| JP2005222729A |
Attorney, Agent or Firm:
Junichi Omori
Ori Akira
Yasuo Iisaka
Ori Akira
Yasuo Iisaka