To provide a film deposition apparatus for realizing the thermal conduction capable of solving the problem of insufficient cooling of a substrate that is caused during the film deposition of a high-capacity active material used for a battery polar plate, to provide a film deposition method using the film deposition apparatus, and to solve the problem of the thermal load in a battery application and also in general vacuum film deposition apparatus.
Film deposition is performed in vacuum on a substrate with particles flying from a film deposition source 9 while the substrate is traveling along a circulating support body 6 which includes at least a hard resin layer 25, a soft resin layer 24 and a metal part 23 in this order from the side in contact with the substrate, and is temperature-controlled by a circulating mechanism of a refrigerant or a heat medium.
COPYRIGHT: (C)2008,JPO&INPIT
Taiji Shinokawa
Imajuku Shoichi
Toshitada Sato
Daisuke Suetsugu
Kunihiko Bessho
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Daisuke Nagano
Kentaro Fujii