Title:
成膜装置及び有機ELデバイス製造装置
Document Type and Number:
Japanese Patent JP5337632
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a film deposition system and a film deposition method, which can improve maintainability by simplifying a mechanism around an alignment including a substrate mask fixing means, or can avoid the deformation of a mask to perform vapor deposition with high precision, or to provide a film deposition system which reduces the generation of dust and gas in a vacuum by arranging a driving part or the like on the atmospheric side or providing wiring, and achieves high productivity.SOLUTION: A substrate is mounted on a substrate holder, and the substrate and a shadow mask are subjected to alignment. The substrate and the shadow mask are attracted and fixed by a magnet provided independently from the substrate holder, and, when a vapor deposition material is vapor-deposited on the substrate in a vacuum chamber, the attraction and fixing is performed in a state where the substrate and the shadow mask are erected. The magnet is an electromagnet, and a substrate mask attraction body for holding the electromagnet and a storage case for storing the mask attraction body are provided.
Inventors:
Kameyama Taiki
Nirazawa Nobuhiro
Kenji Yuba
Yukio Ochiai
Nirazawa Nobuhiro
Kenji Yuba
Yukio Ochiai
Application Number:
JP2009198886A
Publication Date:
November 06, 2013
Filing Date:
August 28, 2009
Export Citation:
Assignee:
Hitachi High-Technologies Corporation
International Classes:
C23C14/50; C23C14/04; H01L51/50; H05B33/10
Domestic Patent References:
| JP2004031181A | ||||
| JP2005222729A | ||||
| JP2010086809A |
Attorney, Agent or Firm:
Polaire Patent Business Corporation