Title:
FILM FORMING EQUIPMENT
Document Type and Number:
Japanese Patent JP2000252271
Kind Code:
A
Abstract:
To enable to supply material gas stably to a film forming chamber while formation of deposit in a carrying path is prevented.
This film forming equipment is provided with gas generating equipment 10 for generating material gas, an airtight film forming chamber 12 which forms a film on a board by using the material gas generated in the gas generating equipment 10, a material gas carrying flow path 14 for connecting the gas generating equipment 10 with the film forming chamber 12, and an oxide gas introducing means 22 for introducing trace amount of oxide gas into the gas generating equipment 10 or the material gas carrying flow path 14.
Inventors:
HORIE KUNIAKI
FUKUNAGA YUKIO
NAKADA TSUTOMU
SUZUKI HIDENAO
FUKUNAGA YUKIO
NAKADA TSUTOMU
SUZUKI HIDENAO
Application Number:
JP5615599A
Publication Date:
September 14, 2000
Filing Date:
March 03, 1999
Export Citation:
Assignee:
EBARA CORP
International Classes:
H01L21/31; C23C16/40; C23C16/44; C23C16/455; (IPC1-7): H01L21/31; C23C16/40; C23C16/455
Attorney, Agent or Firm:
Isamu Watanabe (2 outside)