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Title:
FILM FORMING MASK DEIVCE
Document Type and Number:
Japanese Patent JP2001011598
Kind Code:
A
Abstract:

To facilitate the assembly work of a film forming mask device, and to eliminate deviation or defective film forming of material for forming the film.

This film forming mask device comprises a spacer 4 having storage holes 41 to store a plurality of crystal plates B and comprising a magnetic body with the crystal plate store in this storage hole, an upper mask 5 which is arranged above this spacer 4 and provided with an upper mask pattern for forming the film, and a lower mask 3 which is arranged below the spacer 4 and provided with a lower mask pattern for forming the film. A sheet-like magnet 7 which is closely attached between the spacer and the lower mask, exposes the mask pattern, and has through holes 71 corresponding to the storage holes in the spacer, is provided.


Inventors:
HIRAO SUSUMU
Application Number:
JP18465799A
Publication Date:
January 16, 2001
Filing Date:
June 30, 1999
Export Citation:
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Assignee:
DAISHINKU CORP
International Classes:
H01L41/22; C23C14/04; H01L41/29; H03H3/02; (IPC1-7): C23C14/04; H01L41/22; H03H3/02



 
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