Title:
リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用下層膜及びパターン形成方法
Document Type and Number:
Japanese Patent JP7336078
Kind Code:
B2
Abstract:
An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. A film forming material for lithography comprising a compound having a group of the following formula (0):can solve the problem described above.
Inventors:
Masayoshi Ueno
Kouichi Yamada
Akifumi Chiba
Ken Sugito
Noriko Horiuchi
Takashi Makinoshima
Masatoshi Echigo
Kouichi Yamada
Akifumi Chiba
Ken Sugito
Noriko Horiuchi
Takashi Makinoshima
Masatoshi Echigo
Application Number:
JP2020527503A
Publication Date:
August 31, 2023
Filing Date:
June 24, 2019
Export Citation:
Assignee:
Mitsubishi Gas Chemical Co., Ltd.
International Classes:
G03F7/11; C08F2/48; C08F22/40; C08G73/10; C08G73/12; G03F7/004
Domestic Patent References:
| JP2001220414A | ||||
| JP2012107087A | ||||
| JP11258802A | ||||
| JP2300223A | ||||
| JP2015534598A |
Foreign References:
| WO2016129679A1 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Kazuhiko Naito
Toshifumi Onuki
Kazuhiko Naito
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