FILM-FORMING METHOD AND FILM-FORMING APPARATUS

Title:

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

Document Type and Number:

Japanese Patent JP2005307238

Kind Code:

A

Abstract:

To provide a film-forming method for efficiently and inexpensively forming an SiO2 film, an ITO film (transparent electroconductive film), an SnO2 film (ATO and FTO) or the like on a comparatively wide surface of a glass substrate or the like, and to provide a film-forming apparatus therefor.

The method for forming the film on the surface of the substrate with a chemical vapor deposition process by placing the substrate in a film-forming chamber and passing a source gas in a direction along the surface of the substrate comprises: setting a distance between the surface of the substrate and an inner wall of the film-forming chamber to a predetermined distance in the range of about 0.1 mm to about 10.0 mm; and passing the source gas on the surface of the substrate at a predetermined speed in the range of about 0.4 m/sec to about 4.0 m/sec. The film-forming apparatus therefor is also provided.

Inventors:

NISHINAKA HIROYUKI
KAWARAMURA TOSHIYUKI
FUJITA SHIZUO
MASUDA YOSHIO
KAMETANI KEISUKE
MARUYAMA NORIHIKO

Application Number:

JP2004122834A

Publication Date:

November 04, 2005

Filing Date:

April 19, 2004

Export Citation:

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Assignee:

FUJITA SHIZUO
EMTEC CO LTD
CERAMIC FORUM CO LTD

International Classes:

C23C16/455; H01L21/28; H01L21/285; H01L21/316; H01L21/365; (IPC1-7): C23C16/455; H01L21/28; H01L21/285; H01L21/316; H01L21/365

Domestic Patent References:

JPS4942423B1	1974-11-14
JPH0917732A	1997-01-17
JPH0578151A	1993-03-30
JPH08124859A	1996-05-17
JPH0794419A	1995-04-07
JPH0366121A	1991-03-20
JPH0620961A	1994-01-28
JPS63233521A	1988-09-29

Attorney, Agent or Firm:

Yoshiyuki Kaji
Makoto Suhara

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