Title:
FILM DEPOSITION METHOD AND HEAT TREATMENT DEVICE
Document Type and Number:
Japanese Patent JP2023009781
Kind Code:
A
Abstract:
To improve temperature controllability.SOLUTION: A film deposition method performed in a heat treatment device including a treatment vessel, a tubular member in the treatment vessel, a heating part for heating the inside of the treatment vessel and a gas supply part comprises the steps of: preparing a substrate in the tubular member; controlling temperature in the tubular member by the heating part; and supplying gas including film deposition gas to the treatment vessel from the gas supply part to deposit a film on the substrate. The step of controlling the temperature supplies gas including heat transfer gas to the treatment vessel from the gas supply part.SELECTED DRAWING: Figure 6
Inventors:
KIKUCHI YASUAKI
YOKOI TSUBASA
YAMAGUCHI TATSUYA
SUZUKI KEISUKE
YOKOI TSUBASA
YAMAGUCHI TATSUYA
SUZUKI KEISUKE
Application Number:
JP2021113349A
Publication Date:
January 20, 2023
Filing Date:
July 08, 2021
Export Citation:
Assignee:
TOKYO ELECTRON LTD
International Classes:
C23C16/46
Attorney, Agent or Firm:
Tadashige Ito
Tadahiko Ito
Tadahiko Ito
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