To provide a film pattern forming method enabling a uniformization by controlling easy a film thickness of the film pattern having a wide part and a minute part, a manufacturing method of a high-performance device equipped with the film pattern uniform in such film thickness, an electro-optic device having a high display quality, and an electronic appliance.
The method of forming the predetermined film pattern arranging a functional fluid on a substrate is provided. The method comprises a pattern area forming process of forming the pattern area having the wide part and the minute part connected to the wide part on the substrate, the functional fluid arranging process arranging the functional fluid in the pattern area by discharging selectively the functional fluid to the wide part, and a drying process of forming the film pattern by drying the functional fluid while giving a temperature gradient from the wide portion in a direction toward the minute part.
COPYRIGHT: (C)2008,JPO&INPIT
| JP2005012181A | 2005-01-13 |
Masatake Shiga
Masakazu Aoyama
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