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Title:
FILM FOR PHOTOSENSITIVE MATERIAL
Document Type and Number:
Japanese Patent JP3242739
Kind Code:
B2
Abstract:

PURPOSE: To provide a reformed polyester film for a photosensitive material having excellent curl resolving property, scratch resistance, and transparency.
CONSTITUTION: A copolymerization poly(1,4-dimethylene cyclohexane-2,6- naphthalene dicarboxylate) film is made of 2,6-naphthalene dicarboxylic acid as the main acid component and the cyclohexane dimethanol component of 50-95mol% as the main glycol component, and its glass transition temperature is 90°C or above.


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Inventors:
Tetsuo Ichihashi
Satoshi Kitazawa
Application Number:
JP8436693A
Publication Date:
December 25, 2001
Filing Date:
April 12, 1993
Export Citation:
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Assignee:
Teijin Limited
International Classes:
B29C55/12; C08G63/181; C08G63/189; C08G63/199; C08G63/688; C08J5/18; G03C1/795; B29K67/00; (IPC1-7): G03C1/795; B29C55/12; C08J5/18
Domestic Patent References:
JP254254A
JP5158188A
JP5170889A
JP5170890A
JP6306192A
JP6308665A
JP5105748A
Attorney, Agent or Firm:
Sumihiro Maeda



 
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