Title:
FILM FOR VAPOR DEPOSITION AND VAPOR DEPOSITED FILM USING THE SAME
Document Type and Number:
Japanese Patent JP2001232739
Kind Code:
A
Abstract:
To provide a film for vapor deposition, in which gas barrier properties for oxygen and stream are remarkably excellent, and a vapor deposited film using the same.
The film for vapor deposition is constituted of laminating a polyester B layer containing 0.005-1.0 wt.% hydroxyapatite partiales by 0.01-5 μm thickness on at least one side of a base film (A layer) consisting of a polyester film. Further, in the vapor deposited film. an inorganic thin film is subjected to vapor deposition on the surface of the polyester B layer of the film for vapor deposition.
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Inventors:
HASHIMOTO KOKICHI
YAMANE NOBUHISA
KIMURA MASAHIRO
YAMANE NOBUHISA
KIMURA MASAHIRO
Application Number:
JP2000045548A
Publication Date:
August 28, 2001
Filing Date:
February 23, 2000
Export Citation:
Assignee:
TORAY INDUSTRIES
International Classes:
B65D65/40; B32B27/36; C08J5/18; C08J7/04; C08J7/06; C08K3/32; C08L67/02; C23C14/06; (IPC1-7): B32B27/36; B65D65/40; C08J5/18; C08J7/04; C08J7/06; C08K3/32; C08L67/02; C23C14/06