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Patent Searching and Data


Title:
FILTER MATERIAL AND REMOVAL OF HALOGEN AND PEROXIDE-CONTAINING COMPOUND
Document Type and Number:
Japanese Patent JPH08168672
Kind Code:
A
Abstract:

To remove a halogen and/or a peroxide-containing compd. from a gas or a liquid by performing filtering treatment at a specific temp. using a filter obtained from a material composed of a polyarylene thioether.

The material of a filter is composed of a polyarylene thioether and used in a form of a powder, a fiber, a film or a molded article. 1,4- Polyphenylene sulfide with an average mol.wt. of 4000-200000 is especially pref. Filtering treatment is performed at a temp. of -50-+250°C which is lower than the softening point of this polymer. Halogen is removed by a halogen addition reaction to the respective aromatic rings of the polymer and a peroxide compd. is removed by the conversion of respective sulfide groups to a sulfone stage. The filter using this material is used in the purification of the exhaust duct of a chemical manufacturing plant or a semiconductor or metal manufacturing plant.


Inventors:
IERUKU FUON AISUMONTO
ANDOREEASU SHIYURAIHIAA
GEORUKU FURANKU
Application Number:
JP20691895A
Publication Date:
July 02, 1996
Filing Date:
August 14, 1995
Export Citation:
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Assignee:
HOECHST AG
International Classes:
B01D53/02; B01D15/00; B01D53/46; B01D53/68; B01J20/26; C02F1/28; (IPC1-7): B01J20/26; B01D15/00; B01D53/02; C02F1/28
Attorney, Agent or Firm:
Chika Takagi (2 outside)