To provide a filtration apparatus which is free from such a problem that the filtration performance of a filter is deteriorated by air bubbles, and to provide an apparatus for manufacturing a semiconductor by using the filtration apparatus.
A chamber 22 which is partitioned by a partitioning body 23 having a porous part and is used for housing the liquid to be filtered is arranged in the upper part of a filter housing 21. A filter chamber 25 is arranged below the body 23. A substrate cleaning liquid containing air bubbles, namely the liquid to be filtered, in an outer tank 12 of a substrate cleaning tank 1 is supplied to the chamber 22 by a circulation pump 3. The air bubbles in the liquid to be filtered are returned to the tank 12 from an air bubble discharging part 24. The solid in the liquid to be filtered is filtered/separated with a filter 251 in the chamber 25. The filtrate from which the solid is filtered out is returned to an inner tank 11 of the tank 1.
Toshihide Kodama
Takenaka Ikuo
Keigo Murakami