Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
ポリマー溶液の濾過方法及び製造方法,溶媒の調製方法,ポリマーフイルムの製造方法並びに溶媒の水素イオン濃度測定方法
Document Type and Number:
Japanese Patent JP4175992
Kind Code:
B2
Abstract:

To suppress corrosion of an apparatus by making a recovered solvent alkaline upon film formation in a solution and to suppress inclusion of impurities in a film to be produced.

A volatile solvent generated in film formation is recovered and separated as a purified solvents 146 and 171 by extraction, etc., the purified solvents 146 and 171 are charged in a control tank 181, pH and a water content in a solvent 182 are measured, an acidic solution 207 and/or an alkaline solution 208 is added to the solvent 182 to adjust pH to a desired value, and a water content of the solvent 182 is adjusted to the desired level by passing the solvent 182 through a dehydration install 191, whereby pH and a water content of the solvent 182 are adjusted appropriately, and thus a film produced by using the solvent 182 is excellent in its optical characteristics.

COPYRIGHT: (C)2004,JPO


Inventors:
Toshikazu Nakamura
Yuji Suzuki
Sugiura Hide
Application Number:
JP2003356842A
Publication Date:
November 05, 2008
Filing Date:
October 16, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
FUJIFILM Corporation
International Classes:
B01D35/02; B29B13/10; B01D37/02; B29C41/12; B29C41/24; B29C41/34; C08J5/18; G02B5/30; G02F1/13363; B29K1/00; B29L7/00
Domestic Patent References:
JP2002212338A
JP11092574A
JP2000313766A
JP2002292659A
JP2002187956A
JP4081660A
JP47041479B1
JP56044361U
JP11254466A
JP11333227A
JP63130106A
JP62061611A
JP2002265638A
JP2002079533A
JP2002210767A
JP2001198935A
Attorney, Agent or Firm:
Kazunori Kobayashi
Shigeru Iijima
Kobayashi Hideyoshi