Title:
ろ過処理システムおよびろ過処理方法
Document Type and Number:
Japanese Patent JP6534524
Kind Code:
B2
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Inventors:
Nakamura Yuki
Hiroshi Yoshikawa
Hiroshi Yoshikawa
Application Number:
JP2014261684A
Publication Date:
June 26, 2019
Filing Date:
December 25, 2014
Export Citation:
Assignee:
Organo Corporation
International Classes:
C02F1/44; B01D61/04; B01D61/08; B01D61/58; B01D65/08; C02F1/50; C02F1/76
Domestic Patent References:
| JP2002079246A | ||||
| JP2006263510A | ||||
| JP2009247992A | ||||
| JP2014073451A | ||||
| JP2014101251A |
Foreign References:
| US20090053327 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office