Title:
微細パターン形成体、微細パターン形成体の製造方法、光学素子および光硬化性組成物
Document Type and Number:
Japanese Patent JP5413195
Kind Code:
B2
Abstract:
To provide a photocurable composition with which a fine pattern molded product on which a fine pattern of a mold is highly precisely transferred can efficiently be produced. A photocurable composition comprising 100 parts by mass of a photocurable monomer (A), from 5 to 60 parts by mass of a colloidal silica (B) (solid content) having an average particle size of at most 200 nm, and from 0.1 to 10 parts by mass of a photopolymerization initiator (C), wherein the photocurable monomer (A) comprises a multifunctional monomer (A1) having at least 3 (meth)acryloyloxy groups in one molecule and a bifunctional monomer (A2) having two (meth)acryloyloxy groups in one molecule, at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%.
Inventors:
Yuriko Kaita
Hiroshi Sakamoto
Hirotsugu Yamamoto
Hiroshi Sakamoto
Hirotsugu Yamamoto
Application Number:
JP2009534438A
Publication Date:
February 12, 2014
Filing Date:
September 26, 2008
Export Citation:
Assignee:
Asahi Glass Co., Ltd.
International Classes:
B29C59/02; C08F2/44; C08F220/26; G02B5/18; G02B5/30
Domestic Patent References:
| JPH1160637A | 1999-03-02 | |||
| JP2009016000A | 2009-01-22 | |||
| JP2008202022A | 2008-09-04 | |||
| JP2008084984A | 2008-04-10 | |||
| JP2008019292A | 2008-01-31 |