Title:
微細パターンの製造方法及び製造装置
Document Type and Number:
Japanese Patent JP4189145
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a fine pattern usable for a variety of devices, its manufacturing method, and its manufacturing device. SOLUTION: The fine pattern is manufactured by intimately contacting two objects together, filling a space between them with a solution, producing a gas-liquid interface while moving the objects, and causing a solvent to evaporate from the solution.
Inventors:
Masatsugu Shimomura
Hiroshi Yabu
Toshiki Taguchi
Hiroshi Yabu
Toshiki Taguchi
Application Number:
JP2001342483A
Publication Date:
December 03, 2008
Filing Date:
November 07, 2001
Export Citation:
Assignee:
FUJIFILM Corporation
International Classes:
H05B33/10; B01J19/00; H01L51/50; H05B33/14; H05B33/22
Domestic Patent References:
| JP2001167880A | ||||
| JP2001130141A | ||||
| JP6246209A | ||||
| JP9509057A | ||||
| JP2003033718A |
Attorney, Agent or Firm:
Masahiro Tanaka