Title:
微細気孔膜およびその製造方法
Document Type and Number:
Japanese Patent JP3779875
Kind Code:
B2
Abstract:
A method of producing a microporous membrane comprising the steps of: extruding a polymer at a temperature of from (polymer melting point +10° C.) to (polymer melting point +100° C.); drawing the extruded polymer at a rate of 5~120 m/min in 10~150° C. to obtain a polymer film; annealing the polymer film at a temperature of from (polymer melting point -100° C.) to (polymer melting point -5° C.) for 10 seconds to 1 hour; irradiating both surfaces of the annealed polymer film with an ion-particle amount of 102~1020 ion/cm2 energized at 10-2~107 KeV, at an irradiating distance of 5~100 cm under a vacuum of 10-2~10-[torr; cold stretching the irradiated polymer film at a temperature of from -20° C. to (polymer melting point -40° C.); hot stretching the cold stretched polymer film at a temperature of from (polymer melting point -40° C.) to (polymer melting point -5° C.); and heat setting the hot stretched polymer film at a temperature of from (polymer melting point -80° C.) to (polymer melting point -5° C.).
Inventors:
Li, San Yang
Kim, Munman
Song, Hyunsik
Kim, Munman
Song, Hyunsik
Application Number:
JP2000520892A
Publication Date:
May 31, 2006
Filing Date:
November 16, 1998
Export Citation:
Assignee:
ELGE CORPORATION
International Classes:
B01D67/00; B01D69/00; C08J5/22; B01D71/26; B26F1/31; B29C59/16; C08J7/00; H01M50/417; H01M50/491; H01M50/494; B29C35/08; C08L23/02
Domestic Patent References:
| JP52003987B1 | ||||
| JP7501988A | ||||
| JP1240687A | ||||
| JP2020531A | ||||
| JP2180624A | ||||
| JP3217219A | ||||
| JP4141222A | ||||
| JP5001166A | ||||
| JP5051479A | ||||
| JP54011971A | ||||
| JP59117546A | ||||
| JP62083007A |
Foreign References:
| US2345080 |
Attorney, Agent or Firm:
Sota Asahina
Kei Saki
Kei Saki
Previous Patent: METHOD AND DEVICE FOR DETECTING DUAL TONE ALARM SIGNAL IN TELEPHONE SYSTEM
Next Patent: エレクトロクロミックデバイス用の改良シール
Next Patent: エレクトロクロミックデバイス用の改良シール