Title:
指紋非視認性コーティングおよびそれを形成する方法
Document Type and Number:
Japanese Patent JP7311946
Kind Code:
B2
Abstract:
A process for forming a fingerprint-resistant coating on a substrate comprising activating the substrate by exposure to a plasma, and then depositing on the activated substrate at least one alkyl backbone monolayer, and hydroxyl-polyhedral oligomeric silsesquioxane (OH-POSS) nanoparticles.
Inventors:
Miguel Galvez
Bon June Chan
Isla Altinok
Bon June Chan
Isla Altinok
Application Number:
JP2017111628A
Publication Date:
July 20, 2023
Filing Date:
June 06, 2017
Export Citation:
Assignee:
NBD NANOTECHNOLOGIES, INC.
International Classes:
B05D7/24; B05D3/06; B05D5/00; B32B27/00; C03C17/30; C09D7/63; C09D183/04
Domestic Patent References:
| JP2015212353A | ||||
| JP2015123592A |
Attorney, Agent or Firm:
Tomiga Konishi