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Patent Searching and Data


Title:
FLATTENING METHOD FOR SOLID SURFACE WITH GAS CLUSTER ION BEAM
Document Type and Number:
Japanese Patent JPH08293483
Kind Code:
A
Abstract:

PURPOSE: To prevent defects from being produced on the surface of a substrate by irradiating a solid surface with gas cluster ions being a massive group of atoms or molecules of a substance being gaseous at a normal temperature and pressure.

CONSTITUTION: By using an oxide, a nitride, a carbide, a rear gas substance, and a mixed gaseous substance obtained by mixing them by a proper ratio, and so on, a cluster of gases of these substances are formed. A gas cluster ion beam obtained by ionization on irradiating this gas cluster with electrons under a condition of an accelerating voltage of 10kV irradiates solid surfaces, selecting a beam of specific size as occasion demands. Consequently, it becomes possible to flatten and cleanse the surfaces of boards under a lower temperature condition without damaging the surfaces.


Inventors:
AKIZUKI MAKOTO
HARADA MITSUAKI
DOI ATSUMASA
YAMADA AKIRA
Application Number:
JP5758795A
Publication Date:
November 05, 1996
Filing Date:
March 16, 1995
Export Citation:
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Assignee:
JAPAN RES DEV CORP
SANYO ELECTRIC CO
International Classes:
C23F4/00; H01L21/302; H01L21/3065; (IPC1-7): H01L21/3065; C23F4/00
Attorney, Agent or Firm:
Toshio Nishizawa