Title:
FLATTENING PROCESS OF SUBSTRATE SURFACE FOR MAGNETIC THIN-FILM HEAD
Document Type and Number:
Japanese Patent JPH07169020
Kind Code:
A
Abstract:
PURPOSE: To provide a process for forming a dielectric thin-film coating adequate for use with a magnetic thin-film head.
CONSTITUTION: A spin-on glass material is dropped onto a substrate and this substrate is rotated. The substrate and the thin film formed thereon are preheated to remove the solvent in the spin-on glass material. Next, the thin film is heated within a reducing atmosphere or inert atmosphere and is converted into an SiO2 thin film. Carbon is made to remain in the thin film by the reducing atmosphere or inert atmosphere. The structural characteristics of the thin film are improved by this carbon.
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Inventors:
DANII DEIUAN RII YANGU
Application Number:
JP21562394A
Publication Date:
July 04, 1995
Filing Date:
September 09, 1994
Export Citation:
Assignee:
EASTMAN KODAK CO
International Classes:
C03C14/00; C23C18/12; G11B5/31; B05D1/40; G11B5/39; (IPC1-7): G11B5/31
Attorney, Agent or Firm:
Kenji Yoshida (2 outside)