To provide a manufacturing method of a substrate using a resin base material, capable of preventing defects such as a hole or recessed part or the like of a polymer film formed on a film and smoothing the surface without the need of a large-sized vacuum device, and to further provide a flexible substrate which has high gas barrier property, is excellent in weatherability and does not easily generate crack.
The flexible gas barrier film 1 is manufactured by performing a first step of applying a polymer whose basic unit is a silazane backbone onto a resin base material 2 to form a polymer film 3 whose film thickness is 250 nm and a second step of irradiating the formed film 3 with vacuum ultraviolet light, repeating the first step and the second step, and piling up and stacking the film 3 on the base resin material 2.
FUCHITA TAIJI
TAKAHASHI ATSUSHI
| JP2009503157A | 2009-01-29 | |||
| JPH08325700A | 1996-12-10 | |||
| JPH1016142A | 1998-01-20 | |||
| JP2007237588A | 2007-09-20 |
| WO2007123006A1 | 2007-11-01 | |||
| WO2007012392A2 | 2007-02-01 |
Tetsuya Shinoda
Kota Ogawa
Next Patent: METHOD FOR PREPARING PARTICLE HAVING COVERING LAYER