Title:
Flexible substrate processing device
Document Type and Number:
Japanese Patent JP6133985
Kind Code:
B2
Abstract:
A flexible substrate treatment device comprising at least one tank (22) that accommodates treatment liquid (21), winding rollers including a main roller (23) and a driven roller (24) located above the treatment liquid (21), a positioning roller (25) located in the treating liquid (21) in each tank (22), a detecting unit (26) configured to detect radius or diameter of at least one of the winding rollers, and a movable discharge member (26) fixed to a side wall of each tank (22), including a movable discharge port (271) configured to discharge the treatment liquid (21) and a discharge port position controlling mechanism (272), wherein the movable discharge port (271) can be moved in a direction X perpendicular to a bottom wall of the tank (22).
Inventors:
Zhou Wei Peak
Application Number:
JP2015523367A
Publication Date:
May 24, 2017
Filing Date:
December 03, 2012
Export Citation:
Assignee:
BOE TECHNOLOGY GROUP CO.,LTD.
International Classes:
H05K3/06; H05K3/26
Domestic Patent References:
| JP5075219A | ||||
| JP2001271190A | ||||
| JP2001158986A | ||||
| JP11077435A |
Foreign References:
| US20090159210 |
Attorney, Agent or Firm:
Yasuhiko Murayama
Takashi Watanabe
Shinya Mitsuhiro
Takashi Watanabe
Shinya Mitsuhiro
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