PURPOSE: To establish the fine floating amount head slider with low cost and good yield rate, by forming deep groove only near the slider taper and trailing edge of the etched surface other than the slider floating surface.

CONSTITUTION: On the ion etching surface 3' at the area near taper of the slider floating surface 2 and near trailing etch section, the sand blast method is applied to form the deep groove 4. Thus, the mutual interference between the areas and the slider floating surface 2 can be prevented to block the rise in the pressure. Accordingly, the effect of the etching surface 3' on the slider floating characteristics can be reduced. Further, the amount of etching process d1 is about 10μ and that by the sand blast ds is also about 10μ or more.