Title:
FLOW RATE ADJUSTMENT DEVICE AND GAS CHROMATOGRAPH EQUIPPED THEREWITH
Document Type and Number:
Japanese Patent JP2015206774
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a flow rate adjustment device with which it is possible to facilitate work when setting a total carrier gas flow and column entrance pressure, and a gas chromatograph equipped with the same.SOLUTION: The pressure of a carrier gas flowing in a split passage 23 is controlled to be equal to a set value by a pressure control value 231. It is thereby possible to prevent the column entrance pressure from fluctuating due to carrier gas flow rate adjustment by a pressure control valve 221. This means that the carrier gas flow rate is adjusted by the pressure control valve 221, and, even when the pressure on the upstream side of a resistance element 222 changes, the pressure on the downstream side of the resistance element 222 is maintained constant by the pressure control vale 231, so that it is possible to prevent the fluctuation of the column entrance pressure. Therefore, when setting the total carrier gas flow and the column entrance pressure, there is no need to repeatedly adjust these quantities alternately or fine-adjust these quantities at the same time.
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Inventors:
KOGA MASANORI
Application Number:
JP2014089373A
Publication Date:
November 19, 2015
Filing Date:
April 23, 2014
Export Citation:
Assignee:
SHIMADZU CORP
International Classes:
G01N30/32; G01N30/26
Attorney, Agent or Firm:
Yoshimoto Riki
Masato Shintaku
Masato Shintaku
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